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Vue d'ensemble

Génie électrique : Essential processes for silicon semiconductor device fabrication: etching, diffusion, photolithography. Fabrication of large area PN junctions, selective area PN junctions and MOSFETs. Design and fabrication of simple MOS circuits. Electrical characterization of devices and circuits.

Trimestres : Hiver 2016

Chargés de cours : Shih, Ishiang (Winter)

• (1-3-2)

• Prerequisites: CCOM 206 or EDEC 206, ECSE 334

• Corequisite: ECSE 432 or ECSE 533

• Limited Enrolment - 12

• Lab hours assigned by instructor.